Ruthenium Oxide Electrodeposition on Titanium Interdigitated Microarrays for Energy Storage

Abstract

ABSTRACTThe electrodeposition of hydrated ruthenium dioxide (hRuO2) on Ti interdigitated current collectors deposited onto silicon substrate has been investigated with the objective of preparing a high capacitance and high power micro-supercapacitor (µ-SC) device. Ti current collectors were synthesised by typical photolithography processes, and hRuO2 thin films were electrodeposited from ruthenium chloride precursors. Device specific capacitances exceeding 20 mF·cm−2 were obtained, and more than 80 % of that value is retained even at scan rate as high as 1 V∙s−1 in 0.5 M H2SO4. The mean specific power per active surface area of the device is 368 mW·cm−2. The device is stable and 90% of the initial capacity is retained after 105 cycles (1 V potential window). The characteristic response time of the hRuO2 µ-SC is 250 ms, with low ESR (0.61 Ω cm−2) and EDR (0.07 Ω cm−2) values. All these characteristics demonstrate the potential of such µ-SC devices to be part of the next generation of micro-supercapacitors.