Abstract
ABSTRACTWe have investigated the interactions of Al/Ni, NiAl3/Ni, and Ni2Al3/Ni thin films between 350 and 500°C. Sequential layer deposition and coevaporation were used to prepare the films which were then vacuum annealed and analyzed by Rutherford backseat tering and X-ray diffraction. Initially, NiAl3 is formed, followed by the more Ni-rich phases. All four intermetallic phases were formed.
Publisher
Springer Science and Business Media LLC
Cited by
8 articles.
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