Patterned ZnS Thin-Film Growth using KrCl Excimer Lamp on the Zn Nuclei

Abstract

AbstractPatterned Zn nuclei were formed by exposure with a single shot of an ArF excimer laser through a patterned photo mask onto a Si substrate which adsorbed DMZ (dimethylezinc). A ZnS thin film was then grown only onto the patterned Zn nuclei by KrCl excimer lamp irradiation of the substrate which was sealed in the chamber along with DMZ and H2S.