Large Area Mems: Materials Issues and Applications

Abstract

AbstractConventional MEMS devices are based on silicon micro-machining and their maximum size is limited by the wafer. In contrast, we are exploring micro-machining for large area applications on substrates such as glass using polymeric materials. Our research is focused on the photopolymer SU-8, and we apply the MEMS fabrication technology to large area image sensors and displays. There are many challenges concerning the materials and processes, since large area compatibility is essential and integration with large area electronics may be required. The adhesion of SU-8 to the underlying layers as well as stress in the SU-8 are important issues and surface treatments have been investigated. Two applications of SU-8 MEMS are discussed to illustrate large area applications:. First, in the fabrication of an X-ray imager, high aspect ratio SU-8 walls form a micro-patterned phosphor screen to increase the image resolution. Second, a similar approach of patterning SU-8 into arrays of micro-cells is applied to an electrophoretic display.