Abstract
AbstractProduction requirements for transparent conductors for thin film photovoltaics are reviewed, with particular reference to magnetron sputtered zinc oxide. On-going optimization processes for ZnO:AI prepared on 0.43 m2substrates by bipolar, reactive sputtering from ZnO:A12O3targets and by reactive sputtering from a Zn:Al target are described. Optical emission from the plasma is used to study the state of the sputtering target. Attention is drawn to the spatial dependence of deposition conditions under the cathode.
Publisher
Springer Science and Business Media LLC
Cited by
42 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献