Author:
Bonevich J.,van Heerden D.,Josell D.
Abstract
The present investigation is the first comprehensive comparative study of x-ray diffraction (XRD) and transmission electron microscopy (TEM) results to address the important issue of fcc Ti formation in nanoscale multilayers. Ti/Al multilayers with 7.2 and 5.2 nm composition modulation wavelengths were studied by reflection and transmission XRD as well as transmission electron diffraction (ED), high-resolution TEM, and energy-filtered TEM. Previous reports have claimed deposition of fcc Ti in multilayer systems. Our results demonstrate that the Ti in Ti/Al multilayers deposits in the hcp form and that fcc Ti is merely an artifact of producing specimens for cross-sectional TEM.
Publisher
Springer Science and Business Media LLC
Subject
Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science
Cited by
26 articles.
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