Photo Etching of Polyimide Thin Film by TiO2 Micro Wire Prepared Using Phase Separation-Selective Leaching Method

Abstract

ABSTRACTTiO2 photocatalysts have a strong oxidation ability for organic compounds under UV irradiation. The surfaces of polyimide and polymethyl methacrylate (PMMA) were photocatalytically machined using a porous TiO2 wire prepared by phase separation and selective leaching with elongation. After UV irradiation, these surfaces were decomposed along the length of the TiO2 wire. Such surface decomposition depended on the irradiation angle of UV light and irradiation time. The machining rate of PMMA was higher than that of the polyimide.