Realization of SiO2-B2O3-TiO2 Waveguides and Reflectors on Si Substrates

Abstract

ABSTRACTTiO2-B2O3 doped silica single-mode waveguide arrays on silicon substrates were fabricated by flame hydrolysis soot deposition, glass consolidation and etching. CHF3 reactive ion etching is suitable for more than 15 μm deep vertical gap and reflector preparation. Minimum waveguide propagation loss values of (0.21±0.01) dB/cm were measured on 50 mm single-mode samples. Spectral measurements proved the absence OH absorption in the 850 to 1600 nm range and indicate scattering as the most important loss effect.