Electrodeposited WO3 Thin Films

Author:

Meulenkamp E. A.,de Groot R. J. J.,de Vries J. M. L.

Abstract

ABSTRACTThe electrodeposition of WO3 thin films from peroxy-tungstate solution is discussed. The emphasis is on the feasibility of this deposition technique for production of electrochromic devices. Therefore, the influence of deposition parameters (solution composition, electrodeposition potential, mass transport, etc.) on the properties of WO3 was studied. Furthermore, it was investigated whether electrodeposition of WO3 offers unique possibilities as compared to WO3 deposition by other techniques.

Publisher

Springer Science and Business Media LLC

Subject

General Engineering

Cited by 4 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Chemical Stability of CuWO4 for Photoelectrochemical Water Oxidation;The Journal of Physical Chemistry C;2013-04-23

2. Structural Changes in Electrochromic WO[sub 3] Thin Films Induced by the First Electrochemical Cycles;Journal of The Electrochemical Society;2004

3. A Simplified Method for WO[sub 3] Electrodeposition;Journal of The Electrochemical Society;2002

4. Electrochromic tungsten oxide films: Review of progress 1993–1998;Solar Energy Materials and Solar Cells;2000-01

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