Author:
Popall Michael,Buestrich Ralf,Kahlenberg Frank,Andersson Annika,Haglund Joacim,Robertsson Mats E.,Blau Gerd,Gale Mike,Rösch Oliver,Dabek Alexander,Neumann-Rodekirch Jens,Cergel Lubomir,Lambert Daniel
Abstract
ABSTRACTPhotopatternable hybrid inorganic-organic polymers with negative resist
behaviour have been developed and tested for evaluation in optical and
electrical interconnection technology. They are composed of inorganic oxidic
structures cross-linked or substituted by organic groups. The synthesis
starts from organosilane precursors reacted by sol-gel-processing in
combination with organic crosslinking of polymerisable organic functions. As
a result of these functionalities the properties of the ORMOCER®s are
adjusted to the particular applications. Systematic variation of composition
combined with adaptation to micro system technology allows great flexibility
in processing. The main features of these materials are:• Combined use as dielectric and passivation layers in electrical systems
and devices as well as core and cladding for optical applications enables
e/o applications with high integration levels.• Postbaking at moderate temperatures (120 - 170 °C) enables processing on
low-cost substrates such as FR-4 (a glass-fibre reinforced
epoxy-polymer).• Easily adaptable to thin film technology: spin-on with planarisation >
90 %, via diameters down to 20 μm and high aspect ratio for optical
waveguides have been achieved.Synthesis, modification of the resins towards technological needs, their
thin film technology and the resulting demonstrators will be discussed.
Publisher
Springer Science and Business Media LLC
Cited by
7 articles.
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