Production of Electronically Excited P2 and in from ArF Excimer Laser Irradiation of InP

Author:

Donnelly V. M.,McCrary V. R.,Brasen D.

Abstract

AbstractWe have investigated the decomposition of single-crystal InP surfaces irradiated by a 193 nm ArF excimer laser. These studies provide insight into mechanisms of thermal decomposition, surface diffusion and epitaxy. Pulsed laser exposure leads to evolution of P2 from the surface which is detected by resonance fluorescence resulting from a fortuitous overlap of the v″ = 0 with the laser frequency. P2-evolution occurs above a threshold fluence of 0.12 J/cm2 and lags the peak laser intensity by ∼20 nsec. These observations are explained by a thermally activated decomposition mechanism, as opposed to any direct, photochemical ejection process. Peak surface temperatures have been calculated and are used to predict P2 yields as a function of fluence and time which are in good agreement with experiments. These findings are also discussed in relation to previous studies of excimer laser stimulated growth of InP.

Publisher

Springer Science and Business Media LLC

Subject

General Engineering

Cited by 6 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. A laser dry etch process for smooth continuous relief structures in InP;Applied Physics A Materials Science & Processing;1996-11

2. Sub-Monolayer Ablation of II-VI Semiconductor Surfaces;Microphysics of Surfaces Nanoscale Processing;1995

3. Resonance enhanced multiphoton ionization of the P2 radical;The Journal of Chemical Physics;1994-07

4. Nanosecond and Femtosecond UV Laser Ablation of CdTe (100): Time-Of-Flight and Angular Distributions;MRS Proceedings;1993

5. Excimer laser ablation of CdTe;Laser Ablation Mechanisms and Applications;1991

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