Author:
Coltrin Michael E.,Meeks Ellen,Grcar Joseph F.,Houf William G.,Kee Robert J.,Randall Creighton J.
Abstract
ABSTRACTChemical reactions in the gas-phase and on surfaces are important in the deposition and etching of materials for microelectronic applications. A general software framework for describing homogeneous and heterogeneous reaction kinetics utilizing the Chemkin suite of codes is presented. Experimental, theoretical and modeling approaches to developing chemical reaction mechanisms are discussed. A number of TCAD application modules for simulating the chemically reacting flow in deposition and etching reactors have been developed and are also described.
Publisher
Springer Science and Business Media LLC
Cited by
1 articles.
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