Effect of TiN ARC on Electromigration Performance of Tungsten Plug Via-Reference-Cited by-同舟云学术

Effect of TiN ARC on Electromigration Performance of Tungsten Plug Via

Published:1994 Issue: Volume:338 Page:
ISSN:0272-9172
Container-title:MRS Proceedings
language:en
Short-container-title:MRS Proc.

Author:

Bui Nguyen D.,Pham Van H.,Forsythe D. David,Lee Raymond T.,Yue John T.

Abstract

ABSTRACTThe effect of TiN Anti-Reflective Coating (ARC) layer capping of metal, in a multilevel interconnect system, on the reliability of the tungsten (W) plug has been investigated. EM study on Kelvin via showed that the thin TiN ARC Kelvin via lifetime exhibited a reduction of one order of magnitude compared to that of the thicker ARC thickness (1000Å) when they were stressed in a certain direction. A new testing technique, used to investigate the effect of ARC thickness on the W-plug electromigration (EM) performance, is discussed. The simulation results of current distribution confirmed the proposed failure model of EM performance of W-plug via with different ARC thickness.

Publisher

Springer Science and Business Media LLC

Subject

General Engineering

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