Refinement of Plas Samples by Using Afm Image and First Observation of Plas Signals on Amorphous Carbon Nitridea-CNx Films

Abstract

ABSTRACTThe shape of several waveguide end of samples for photoluminescence absorption spectroscopy (PLAS) was studied by atomic force microscope (AFM), because there was an experimental problem where some samples for PLAS did not work. Using the result of AFM, the waveguide end was reshaped by plasma dry etching. The shortening of the etching time was an effective method to improve the structure of the waveguide end. Secondly, the PLAS method was extended to the other materials from a-Si:H. The PLAS signal of amorphous carbon nitride a-CNx was detected for the first time. Amorphous carbon nitride a-CNx film itself and the interface between a-CNx and a-Si02 are found as good as a-Si:H and the interface between a-Si:H and a-Si 3N4+x:H, respectively.