Local structure and defects in ultrahigh-temperature materials of borosilicon carbonitride

Abstract

We have investigated structural changes of amorphous borosilicon carbonitride materials with atomic ratios of B/Si/C of 2/3/6 and 4/3/6 calcined at several temperatures. The boron K-edge x-ray absorption spectra showed that the structures of both hexagonal boron nitride ([BN3] unit) with nitrogen-void defects ([BN2] and [BN1] units) and boron oxide existed in the samples, and the relative peak intensity due to the [BN3] unit became stronger by increasing the calcined temperature. It is thought that the well-developed B–N chain and the borosilicate glass coating lead to the high resistance to oxidation at high temperature. X-ray diffraction and infrared measurements followed the x-ray absorption near-edge spectroscopy findings.