Pulsed UV Excimer Laser Doping of Semiconductors

Abstract

ABSTRACTUV excimer lasers have been used to dope semiconductors by a one–step process in which the laser serves both to release dopant atoms from a parent molecule and to melt the surface, allowing incorporation of dopant atoms by liquid state diffusion. The technique has been used to dope Si, GaAs, and InP. Shallow junctions formed by the technique have been fabricated into efficient Si and GaAs solar cells.