Author:
Yost B.,Li Che-Yu,Bergman-Reuter Bette,Sullivan Tim
Abstract
AbstractHardness properties of CVD SiO2, films deposited on silicon substrates are investigated by microindentation techniques. It is found that the hardness of these films is sensitive to the thermal histories and doping and is less influenced by the residual stress levels.
Publisher
Springer Science and Business Media LLC
Cited by
1 articles.
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