Author:
van Heerden David,Zolotoyabko Emil,Shechtman Dan
Abstract
Electrodeposited Cu/Ni multilayers with different modulation lengths Λ = 4–18 nm were examined by means of x-ray diffraction and transmission electron microscopy. Preferred orientations of [111], [110], and [001]-types, as determined from relative x-ray diffraction peak intensities, were seen in the multilayers. By means of computer simulations of the measured x-ray diffraction spectra, several parameters of the multilayers, such as Λ-values and fluctuations ΔΛ, as well as lattice strain, were determined. Multilayers having large Λ were found to be fully relaxed due to interfacial dislocation formation. In short Λ [001]-texture multilayers partial strain relaxation occurs, probably due to the incorporation of Cu into the Ni layers. Both of the processes lead to the diffuse Cu/Ni interfaces. Short wavelength multilayers with a [111]-preferred orientation were almost fully strained. The importance of the [111]-texture in the improvement of mechanical strength of Cu/Ni multilayers resulting from its enhanced ability for stain accommodation is discussed.
Publisher
Springer Science and Business Media LLC
Subject
Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science
Cited by
18 articles.
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