Electron Spin Resonance of Hydrogenated Amorphous Silicon Alloyed with Sulfur

Abstract

ABSTRACTElectron spin resonance (ESR) and light-induced electron spin resonance (LESR) measurements were performed on sulfur-doped hydrogenated amorphous silicon (a-SiS:H). At low S doping levels (H2S/SiH4 ≤ 10−3 in gas phase), the ESR and LESR line shapes are similar to those observed in undoped a-Si:H. The dark spin density generally increases with S doping and reaches 5×1016 cm−3 at H2S/SiH4 ≈ 10−3. On the other hand, at high S concentration, the dark spin density increases significantly with S concentration. The ESR and LESR line shapes become identical and asymmetric, a fact that implies the ESR and LESR signals result from the same kind of ESR center. Since S doping is very inefficient, the ESR signals probably are due to defects instead of trapped carriers in band tails. The asymmetry of the ESR and LESR line shapes at high sulfur concentration may result from either more than one type of defect or an asymmetry in the g tensor of a single defect. The photo-excitation of H-passivated, S-related defects could also contribute to the LESR.