Abstract
AbstractProgress in the development of ion implantation enhanced quantum well shape modification as a technique for monolithically integrating optoelectronic devices of varying functionalities is reviewed. Fundamental issues related to the physics of the technique, both material issues and device issues, are considered and the performance of both discrete and integrated devices is discussed. The main conclusion of this review is that there are no inherent drawbacks to the utilization of this technique and some serendipitous advantages but that more work on reproducibility and reliability is required to ensure commercial viability.
Publisher
Springer Science and Business Media LLC