A Mass Spectrometric System for the Study of Transient Plasma Species in Thin Film Deposition

Abstract

ABSTRACTA system is described for mass spectrometric detection of transient gaseous species involved in reactive plasma deposition of materials. The equipment comprises a three stage differentially pumped UHV quadrupole mass spectrometer chamber, which permits modulated molecular beam sampling over a short path-length, direct from the plasma at 0.1–1.0 torr pressure. Operation of the system and optimum conditions for maximum signal-detection are detailed, and preliminary results for species formed in a silane-argon high-power rf discharge are reported. Spectra mostly agree with those obtained by Turban and Catherine using a lower power rf plasma, although some evidence is observed for the formation of increased SiH species at higher power.