Author:
Whichard G.,Mogul H. C.,Weeks R. A.,Stark J. D.,Zuhr R.
Abstract
ABSTRACTEllipsometric and ion backscattering techniques were used to investigate the changes in refractive index and thicknest of a surface layer of high purity silica modified by transition metal ion implantation. Samples were implanted with Cr+, Mn+, and Fe+ ions to doses ranging from 0.5 × 1016 to 6.0 × 1016 ions/cm2. The refractive index of the ion implanted region increased with increasing implantation dose. A single layer model for the implanted region was determined to be consistent with the ion backscattering profiles and ellipsometric data.
Publisher
Springer Science and Business Media LLC
Cited by
1 articles.
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