Opto-Electronic Properties of Ge and Si Related Nanostructures on Ultrathin Si Oxide Covered Si Surfaces

Abstract

AbstractWe present a method to form semiconductor nanodots on Si substrates by using ultrathin Si oxide technology and the results on their opto-electronic properties. We can form ultra-small semiconductor nanodots with the size of ˜5nm and ultra-high density of ˜1012 cm−2 on Si surfaces covered with ultrathin SiO2 films of ˜0.3nm thickness. We focus on the Ge and GeSn nanodots on Si substrates and those embedded in Si films. These structures exhibit quantum confinement effects and intense luminescence in the energy region of about 0.8 eV.