Abstract
AbstractOH vibrational Thermally Assisted Fluorescence (THAF) temperature measurements have been demonstrated in both premixed and diffusion flames. The accuracy of the measurements is generally better than 100 K over a wide range of flame conditions for which the collisional quenching rate varies considerably. Application of this technique for temperature measurement in Chemical Vapor Deposition (CVD) flows, for which the quenching rate is relatively constant, should exhibit greater accuracy. THAF measurements in these flows are limited by signal to noise considerations, and should be possible down to pressures of 103-104 Pa or less.
Publisher
Springer Science and Business Media LLC