Effects of (100)-textured LaNiO3 Electrode on the Deposition and Characteristics of PbTiO3 Thin Films Prepared by rf Magnetron Sputtering

Abstract

Highly (100)-oriented thin films of PbTiO3 were prepared on (100)-textured LNO/Pt/Ti/SiO2/Si substrates by rf magnetron sputtering at temperatures ≥480 °C, while randomly oriented PbTiO3 films were obtained on Pt/Ti/SiO2/Si substrates. The textured LNO layer can help to control the orientation of PbTiO3 thin films, and reduce their surface roughness quite significantly. The dielectric constant (εT) of PbTiO3 films deposited on LNO was lower than that of films on Pt and the dielectric loss (tan δ) increased when a higher deposition temperature or longer time was used. The highly (100)-textured PbTiO3 films also showed different ferroelectric hysteresis characteristics, i.e., a higher coercive field and a lower remanent polarization, from that of randomly oriented films deposited on Pt.