Author:
Paelinck P.,Vancauwenberghe O.,Wiele F. Van de
Abstract
AbstractA fast simulation tool for MOS/SOI process optimization has been developed.lt solves Poisson's and one carrier current density equations in the one-dimensional case. NMOS and PMOS transistors characteristics in the linear region are reliably computed over a wide range of voltages. Moreover, special attention has been paid for threshold voltage (calculated by extrapolating the inversion charge as a function of front gate voltage ) and subthreshold current calculation. Therefore, process parameters can be easily selected in order to get enhanced device capabilities.
Publisher
Springer Science and Business Media LLC
Cited by
1 articles.
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