USJ Dopant Bleaching and Device Effects in Advanced Microelectronic Plasma Enhanced Resist Strip Processing

Abstract

ABSTRACTThe impact of low temperature plasma resist strip on doped silicon surface and microelectronic device performance is investigated using different chemical gas mixtures. In this investigation, different plasma treatments where applied on non-structured and structured silicon on insulator (SOI) wafers post ultra shallow surface implants .The main surface impacts dopant bleaching and oxide loss in conjunction with plasma enhanced re-oxidation are analyzed by time of flight secondary ion mass spectrometry (TOF-SIMS) and electrical measurements of microelectronic test devices. As the result, a long range plasma radiation induced dopant activation and deactivation is separated as the main effect from surface oxide loss and re-oxidation processes. This implies further optimization of plasma resist strip processes for device improvements.