Laser-induced forward transfer: A new approach for the deposition of high Tc superconducting thin films

Abstract

We propose in this work a new approach, named laser-induced forward transfer, for the rapid deposition and patterning in a clean environment of high Tc superconducting thin films. A stoichiometric high Tc compound is initially deposited in a thin layer on an optically transparent support by laser evaporation or another more conventional technique. By irradiating under vacuum or in air the precoated layer with a strongly absorbed single laser pulse through the transparent support, we are able to remove the film from its support to be transferred onto a selected target substrate, held in contact to the original film. Using this technique, we have successfully transferred with one single pulse, provided by an excimer or a Nd:YAG laser, YBaCuO and BiSrCaCuO precoated thin films on various substrates. The Rutherford backscattering spectrometry experiments do not show any strong modification in the composition of the transferred layer against the source material, and the superconducting phases for the two types of compounds were obtained after subsequent thermal annealing carried out in a furnace around 850–900 °C in O2. For the BiSrCaCuO films transferred onto MgO substrates, we have measured an onset critical temperature of about 90 K with a zero resistance at 80 K.