Fabrication of iron carbide by plasma-enhanced atomic layer deposition-Reference-Cited by-同舟云学术

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Fabrication of iron carbide by plasma-enhanced atomic layer deposition

Published:2019-11-08 Issue:7 Volume:35 Page:813-821
ISSN:0884-2914
Container-title:Journal of Materials Research
language:en
Short-container-title:J. Mater. Res.

Author:

Tian Xu,Zhang Xiangyu,Hu Yulian,Liu Bowen,Yuan Yuxia,Yang Lizhen,Chen Qiang,Liu Zhongwei

Abstract

Abstract

Publisher

Springer Science and Business Media LLC

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Reference42 articles.

1. Chemical Vapor Deposition of Iron, Iron Carbides, and Iron Nitride Films from Amidinate Precursors

2. Fe5C2Nanoparticles with High MRI Contrast Enhancement for Tumor Imaging

3. Sputter deposition of transition-metal carbide films — A critical review from a chemical perspective

4. Structure and tribology of biocompatible Ti–C:H coatings

5. Atomic layer deposition of nickel carbide for supercapacitors and electrocatalytic hydrogen evolution

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1. Atomic Layer Deposition of Molybdenum Carbide Thin Films;Advanced Materials Interfaces;2024-07

2. Atomic layer deposition of magnetic thin films: Basic processes, engineering efforts, and road forward;Applied Physics Reviews;2023-12-01

3. Plasma enhanced atomic layer deposition of manganese nitride thin film from manganese amidinate and ammonia plasma;Journal of Vacuum Science & Technology A;2023-05-23

4. Conformal chemical vapor deposition of boron-rich boron carbide thin films from triethylboron;Journal of Vacuum Science & Technology A;2023-01

5. Fluidized-bed plasma enhanced atomic layer deposition of Pd catalyst for low-temperature CO oxidation;Journal of Vacuum Science & Technology A;2022-12

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