Author:
Masuda Atsushi,Ishibashi Yoriko,Matsumura Hideki
Abstract
ABSTRACTThermal influence on film preparation in catalytic chemical vapor deposition (Cat-CVD), often called hot-wire CVD, is investigated since heat radiation from catalyzer and thermal transport by introduced gases are one of the dominant factors to determine the film properties. It was found that catalyzer-surface area is a key parameter determining not only the deposition rate but also the thermal influence. “Catalytic platE” instead of the conventional wire was proposed in order to suppress the heat radiation with keeping the catalyzer-surface area. Cat-CVD method employing the catalytic plate is superior to conventional “hot-wirE” CVD method.
Publisher
Springer Science and Business Media LLC
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