Surface Electronic States of Low Temperature H-plasma Cleaned Si(100) and Ge(100) Surfaces

Author:

Cho Jaewon,Schneider T.P.,Nemanich R.J.

Abstract

ABSTRACTThe surfaces of Si(100) and Ge(100), cleaned at low temperatures by H-plasma, were studied by Angle Resolved UV-Photoemission Spectroscopy(ARUPS). In the case of Si(100), H-plasma exposure produced ordered H-terminated crystallographic structures with either a 2×1 or 1×1 LEED pattern while for Ge(100) a weak H-terminated 2x1 pattern was obtained. The hydride phases, found on the surfaces of the cleaned Si(100), were shown to depend on the temperature of the surface during H-plasma cleaning. The electronic states for the monohydride and dihydride phases were identified by ARUPS. When the plasma cleaned surface was annealed, the phase transition from the dihydride to monohydride was observed. For the Ge(100) surface, an ordered 2x1 monohydride phase was obtained from the surface cleaned at 180°C. After plasma exposure at ≤170°C a 1×1 surface was observed, but the ARUPS indicated that the surface was predominantly composed of disordered monohydride structures. After annealing above the H-dissociation temperatures, the dangling bond surface states were identified for both Si and Ge. The Si(100) and Ge(100) ARUPS spectra shifted after annealing, indicating that the H-terminated surfaces were unpinned.

Publisher

Springer Science and Business Media LLC

Subject

General Engineering

Cited by 2 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Native oxide removal from Ge surfaces by hydrogen plasma;Journal of Vacuum Science & Technology A;2018-05

2. In Situ Process Control of Trilayer Gate-Stacks on p-Germanium With 0.85-nm EOT;IEEE Electron Device Letters;2015-09

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370

www.globalauthorid.com

TOP

Copyright © 2019-2024 北京同舟云网络信息技术有限公司
京公网安备11010802033243号  京ICP备18003416号-3