Author:
Leveder Tanguy,Landis Stefan,Davoust Laurent,Chaix Nicolas
Abstract
ABSTRACTUniformity of nanoimprint lithography has been quantitatively studied through the ability to replicate regular lines arrays by wafer-to-wafer imprint. Two statistic coefficients have been defined in order to quantify the local uniformity and the ability to identically imprint two similar areas respectively. Those coefficients enable to compare different imprint profiles in terms of uniformity and to point out the efficiency of soft layers insertion into the imprint stack.
Publisher
Springer Science and Business Media LLC
Cited by
1 articles.
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1. NanoImprint Lithography;Nano-Lithography;2013-03-07