Large Area Photochemical Dry Etching of Polymers with Incoherent Excimer UV Radiation

Abstract

AbstractPhotochemical dry etching and surface modification of different polymers, e.g., poly-methylmethacrylate (PMMA), polyimid (PI) and poly-ethylene terephthalate (PET) was achieved with an incoherent excimer UV source. Decomposition and etch rates of PMMA were determined as a function of UV intensity and exposure time at different wavelengths λ = 172 nm (Xe2*), λ = 222 nm (KrCI*) and λ = 308 nm (XeCI*). The morphology of the exposed area of PMMA was investigated with SEM. The etching of the polymers can be explained as a result of extensive photooxidation. The results are compared with data obtained from mercury lamp and excimer laser experiments.