Formation and Growth of Voids And/Or Gas Bubbles in Thin Films

Abstract

Several recent transmission electron microscopy studies have shown that small voids and/or gas bubbles are present in various thin metallic films. The formation and growth of these voids have been studied as a function of the deposition and subsequent annealing conditions. From these studies, two conflicting views as to why these voids grow have emerged. Some investigators claim that the void growth occurs as a result of the precipitation of trapped gaseous impurities, whereas others believe that the growth is due to the annihilation of quenched-in excess vacancies at pre-existing voids. In this paper we present arguments with which we hope to resolve the present controversy.