Author:
Fix Renaud M.,Gordon Roy G.,Hoffman David M.
Abstract
AbstractA novel process for the low temperature synthesis of titanium nitride thin films by APCVD is described. TiN coatings containing less than one atom percent of carbon and oxygen were deposited at 200 °C on silicon, vitreous carbon, glass, stainless steel and plastic substrates using Ti(Nme2)4 and ammonia gas as precursors. The films were characterized by Rutherford backscattering spectrometry and X-ray photoelectron spectroscopy.
Publisher
Springer Science and Business Media LLC
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