Author:
Omri M.,de Mauduit B.,Claverie A.
Abstract
ABSTRACTWe have studied by TEM the thermal evolution of a population of extrinsic defects composed of a mixture of both perfect and faulted dislocation loops (PDL's and FDL's respectively). It is shown that, when isolated from an external sink, the FDL's trap the Si interstitial atoms emitted by PDL's. When a highly recombining surface is located close to the defects, it preferably « pumps » the PDL's. On the contrary, injecting Si(int)'s from the surface helps stabilizing the PDL's while the FDL's grow. These experiments clearly show that FDL's are more stable, i.e. have higher binding energies than PDL's.
Publisher
Springer Science and Business Media LLC
Cited by
10 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Direct evidence of the recombination of silicon interstitial atoms at the silicon surface;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2004-02
2. Ion beam induced defects in crystalline silicon;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2004-02
3. Transient-diffusion effects;Applied Physics A: Materials Science & Processing;2003-05-01
4. Extended defects in shallow implants;Applied Physics A: Materials Science & Processing;2003-05-01
5. Current status of models for transient phenomena in dopant diffusion and activation;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2002-01