Laser Vaporization and Deposition of Lead Zirconate Titanate

Author:

Schenck Peter K.,Cook Lawrence P.,Zhao Jianrong,Hastie John W.,Farabaugh Edward N.,Chiang Chwan-Kang,Vaudin Mark D.,Brody Philip S.

Abstract

ABSTRACTLaser-induced vaporization of ceramics shows promise as a technique for the deposition of thin films of these materials. Critical to the utility of this technique is an understanding of the laser-material interaction, plume formation and dynamics, material transport and how variations in the vaporization conditions affect the deposited film. Lead zirconate titanate (PZT, Zr/Ti-47/53) targets were irradiated using a q-switched Nd:YAG laser (15 ns, 100 mJ at 1.064 /μm) . The deposition chamber was maintained at a pressure of 100 mTorr oxygen. Material from the plume was collected on silicon wafer substrates, suspended 1.0 - 3.0 cm above the target. The films were characterized by SEM/EDX, TEM, x-ray diffraction and electrical measurements before and after annealing. Very thin films were deposited on carbon coated metal grids for observation in the TEM using a hot stage to study crystallization. Temporally and spatially resolved spectra of the light emitted by the laser-generated plume were obtained with an optical multichannel analyzer (0MA) to yield information on the plume generation and chemistry of the deposition process. These spectra indicate that under these conditions a plasma is created above the target surface which persists for -100 ns after the laser pulse.

Publisher

Springer Science and Business Media LLC

Subject

General Engineering

Reference4 articles.

1. 3 Schenck P.K. , Bonnell D.W. , and Hastie J.W. , “Insitu Analysis of Laser-Induced Vapor Plumes”, Am. Vac. Soc, Proc. Joint Int. Laser Science and Am. Vac. Soc. Conf., Atlanta, October, 1988 (in Press).

2. 4 Cook L. P. , Schenck P. K. , Zhao J. , Farabaugh E. N. , and Chiang C. K. , “Ceramic Thin Films by Laser Deposition”, to be published in Proc. Symp. on Ceramic Thin and Thick Films, April, 1989, ACerS.

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