Author:
Mattson J.,Brodsky M. B.,Ketterson J.,You H.
Abstract
AbstractWe report X-ray diffraction and in-situ RHEED( Reflection High Energy Electron Diffraction) measurements on Cr thin films deposited on LiF[001] single crystal substrates for thicknesses up to 300 nm and for substrate temperatures from 30 to 450°C. From these measurements we determine the range of deposition conditions necessary for epitaxial growth and the stress in these films as a function of film thickness.
Publisher
Springer Science and Business Media LLC
Cited by
5 articles.
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