Characterization of ErAs/GaAs and GaAs/ErAs/GaAs Structures

Abstract

AbstractA series of ErAs/GaAs and GaAs/ErAs/GaAs epilayers have been grown on (100) GaAs substrates by molecular-beam epitaxy. Misfit dislocations at the ErAs/GaAs interface have been analyzed using the weak-beam technique of transmission electron microscopy. The microstructure of GaAs/ErAs/GaAs layers have been characterized using conventional and high-resolution electron microscopy. Twinning inside the upper GaAs layer is the major defect. Although the desired epitactic (100) GaAs on (100) ErAs does dominate, small grains of GaAs with (111) or {122} orientations have been observed at the GaAs/ErAs heterojunction.