Localized Fabrication of Mental Contacts and Electrical Measurements on Multi walled Carbon Nanotubes

Abstract

AbstractA Focused Ion Beam (FIB) microscope was to locally deposit platinum contacts on Multiwalled Carbon Nanotubes (MWNTs) for resistance and current carrying capability measurements. We have determined the resistivity of these ultra-thin Pt lines and the MWNT-Pt contact resistance to account for contributions to the MWNT measurements. We have studied the effects of secondary mental deposition around the contacts (‘halo’ effect) on the MENT electrical measurements as well as effects of ion beam exposure and possible ways to avoid/minimize them. Transmission Electron Microscopy data was used to evalutate MWNT surface modifications due to ion beam exposure and Pt deposition.