Abstract
ABSTRACTTransmission electron microscopy (TEM) and X-ray diffraction (XRD) were performed to study the interfacial reactions of Ni/GaAs contact system as a result of isothermal annealing and two step annealing. Ni2GaAs was observed to exhibit preferred orientation relationships with respect to GaAs substrate after 300–350°C annealing. The compound decomposed to NiAs and Ga-compounds after 400°C annealing. NiAs was also found to grow preferentially on GaAs. The step annealing was found to be ineffective in varying the morphological structure of interface.
Publisher
Springer Science and Business Media LLC
Reference4 articles.
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2. Alloying reaction in thin nickel films deposited on GaAs
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