Author:
Williams Paul A.,Jones Anthony C.,Tobin Neil L.,Marshall Paul A.,Chalker Paul R.,Davies Hywel O.,Smith Lesley M.
Abstract
ABSTRACTBismuth titanate thin films have been grown by liquid injection MOCVD using Bi(mmp)3 in combination with the new Ti precursors Ti(OPri)2(mmp)2 and Ti(mmp)4 (mmp = OCMe2CH2OMe). Films were grown on Si(100) substrates over the temperature range 300 – 600°C, and were shown to consist predominantly of the Bi4Ti3O12 phase at substrate temperatures > 500°C.
Publisher
Springer Science and Business Media LLC