Thermal Behaviour of Au/Pd/Gaas Contacts

Author:

Pécz B.,Veresegyházy R.,Mojzes I.,Radnóczi G.,Sulyok A.,Malina V.

Abstract

ABSTRACTAu(85nm)/Pd(55nm)/GaAs(100) samples were heat treated in the 325–425°C temperature range. The annealed samples have been investigated using Rutherford Backscattering Spectrometry, Auger Electron Spectroscopy and Transmission Electron Microscopy. The gold layer remained largely unreacted up to 300°C. Significant Pd diffusion into GaAs consuming a 50–60 nm thick layer of GaAs is evident in the case of sample annealed at 325°C and a slight Au diffusion is also noticeable. In the sample annealed at 350°C the spreading of palladium was very quick. A strong reaction took place between the GaAs and the metallization in the case of sample heat treated at 375°C. At this temperature we have identified the PdGa phase using electron diffraction.

Publisher

Springer Science and Business Media LLC

Subject

General Engineering

Cited by 1 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Refractory metallizations on GaAs FET’s;Acta Physica Hungarica;1994-03

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