Author:
Girolami Gregory S.,Gozum John E.
Abstract
AbstractA review is presented of early and recent advances in the metal-organic chemical vapor deposition (MOCVD) of thin films from organotransition metal and related precursors. Routes to pure metals and alloys, metal carbides, metal borides, metal nitrides, metal silicides, and related materials will be summarized. Also included is a discussion of both the advantages and disadvantages of employing metal-organic precursors that contain transition elements.
Publisher
Springer Science and Business Media LLC
Cited by
13 articles.
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