Growth of (GaAs)1−x (Si2)x Metastable Alloys using Migration-Enhanced Epitaxy

Abstract

ABSTRACTEpitaxial (GaAs)1−x (Si2)x metastable alloys have been grown on GaAs (100) substrates using Migration-Enhanced Epitaxy in the composition range of 0<x<0.25. The lattice constant a0 of the alloys was found to decrease with increasing Si content from 0.56543nm at x=0 to 0.5601nm at x=0.25. Double-crystal x-ray diffraction rocking curve measurements and cross-sectional transmission electron microscopy studies made on a 10 period (GaAs)1−x(Si2)x/GaAs strained layer superlattice indicated sharp and abrupt interfaces. High crystalline quality GaAs has been grown on Si substrates using (GaAs)0.80(Si2)0.20/GaAs strained layer superlattices as buffer layers.