Author:
Otte Karsten,Lippold Gerd,Frank Wilfried,Wenzel Axel,Krauser Johann,Weidinger Alois,Schindler Axel
Abstract
ABSTRACTHydrogen with an energy of 300 eV was implanted into single crystalline CuInSe2 samples at temperatures of 200 °C and 300 °C during implantation. We found that the hydrogen is not limited to the expected implantation depth but diffuses into the bulk of the sample. The hydrogen concentration ranges from 1019 H/cm3 in a depth of about 300 nm up to some 1021 H/cm3 next to the surface and resembles a diffusion profile. The hydrogen induced change of composition was not only at the surface, but also up to a depth of about 200 nm similar to that of the hydrogen profile. Mainly a Cu deficiency after hydrogen implantation could be observed and is explained as the passivation of VCu by hydrogen and the additional production of VCu by the induced band-bending.
Publisher
Springer Science and Business Media LLC
Cited by
2 articles.
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