Device Quality Silicon Carbon Thin Films

Abstract

ABSTRACTWe attain good quality hydrogenated silicon carbon films grown by plasma-enhanced chemical vapor deposition. Similar to hydrogenated silicon, we observe a characteristic edge of crystallinity at medium hydrogen dilution ratios of the feedstock gases. In the transition regime between amorphous and nanocrystalline phase, our thin films exhibit a remarkable ratio of photocarrier mobility-lifetime product to dark conductivity of 105... 106 cm3A-1 and minimum light-induced degradation. The static index of refraction increases and the resonance energy decreases for films below the onset of crystallinity which points towards a higher compactness of the protocrystalline material. Hence, alloying of hydrogenated silicon with small amounts of carbon leads to the formation of SiC:H layers that feature an optical bandgap of 2.0 eV and simultaneously maintain the superior optoelectronic properties of protocrystalline silicon.