Quantum Well Intermixing for Optoelectronic Applications

Abstract

AbstractIon implantation induced intermixing of GaAs-AlGaAs quantum well structures with H, O and As ions is investigated by low temperature photoluminescence. Large energy shifts are observed in all the cases, though recovery of photoluminescence intensities in proton case is more significant than others. Energy shifts are linear with proton dose and no saturation was observed even up to a dose of ∼ 5 × 1016 cm−2. Saturation in energy shifts are seen for both As and 0 ions at high doses. Energy shifts are also found to be dependent on Al composition of the barriers. Wavelength shifted quantum well lasers are fabricated with energy shifts of about 5 nm with no changes in threshold current using proton implantation. Anodic oxide induced intermixing of GaAs-AlGaAs quantum wells is demonstrated.