Author:
Nguyen Tai D.,Underwood James H.
Abstract
ABSTRACTThe relationship between intrinsic stress and microstructural evolution in nanometer Mo/Si multilayers deposited by magnetron sputtering at low working pressure (2.5 mTorr) is studied. The stress depends strongly on the microstructure which evolves with the multilayer period. In-situ thermal stress measurements show stress relaxation is observed in Mo/Si multilayers after annealing at 300°C in nitrogen ambient, due to microstructural changes in the multilayers. Average stress exhibits changes after annealing at 500°C which correspond to increased interdiffusion between the layer materials and crystallization at the interfaces.
Publisher
Springer Science and Business Media LLC
Cited by
6 articles.
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