Author:
Wroblewski A.,Chechenin N.,BØttiger J.,Chevallier J.,Karpe N.,Krog J. P.
Abstract
AbstractUsing ion beam assisted deposition, 1.5–2.2 μm thick molybdenum and nickel films were prepared on silicon substrates. Some films were found to be strongly textured. By changing the rate of Ar+ bombardment during the deposition, the resulting in-plane film stresses could be changed from being strongly tensile to strongly compressive. Using nanoindentation, the hardness and elastic modulus were measured for all films, but no major influence of the film stress or different textures could be found. The elastic modulus of the Ni films was found to be close to its polycrystalline bulk value, and that of Mo was found to be about 70% of its polycrystalline bulk value.
Publisher
Springer Science and Business Media LLC
Cited by
1 articles.
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